適用於各式元件的沉積技術

Applied^™ Picosun^™ Sprinter^™

The Applied^™ Picosun^™ Sprinter^™ system is designed to disrupt batch ALD production in 300 mm manufacturing lines in the IoT, Communications, Automotive, Power, and Sensors (ICAPS) markets. In Sprinter, barrier, dielectric, high-k oxide, optical, and other films are deposited with perfect ALD in mass production volumes.

Applied Picosun Sprinter combines the leading single-wafer film quality and uniformity with fast processing, high throughput, and uncompromising reliability.

The core of the Applied Picosun Sprinter is its reaction chamber, where fully laminar precursor flows ensure perfect  ALD deposition with no parasitic CVD growth. This minimizes the need for system maintenance.

Compared to vertical furnace reactors typically used for batch ALD processing, Sprinter provides higher film quality with a lower thermal budget, so it is suitable also for temperature-sensitive devices.

Sprinter combines very fast process times, dedicated pre-heating and cooling chambers, and small batch sizes, which allows excellent production flexibility and reduced risk without sacrificing throughput.

Applied Picosun Sprinter is made in Finland.