skip to main content

模拟

无线技术的飞速发展,推动了模拟信号和混合信号集成电路市场的增长。更高的频率和输出功率是此类器件的技术要求。

The ongoing development and evolution of 200mm production technologies deliver device and yield improvements and overall fab productivity gains - all of which translate to sustained ROI for semiconductor manufacturers.

To address these requirements device manufactures are continuing to reduce their technology node at 200mm, moving to ≤0.13µm devices. Applied Materials offers chamber and system upgrades that enable installed base tools to meet these tighter performance requirements as well as provide higher throughput for increased fab productivity. These upgrades include remote clean for CVD chambers and pumping improvements for metal etch to improve particle performance as well as local center finding capability to improved wafer placement for PVD applications.