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The Varian VIISta PLAD™ plasma-based doping technology enables high-dose doping, material modification, and sidewall doping solutions at high volumes.
The system delivers industry-leading dose retention and uniformity, with key features enabling the following benefits:
It delivers device performance and yield enhancement through differentiated near-surface dopant profile tuning capability. VIISta PLAD technology utilizes the Varian Control System to deliver reliable high-volume solutions to customers worldwide. This commonality helps to shorten the time to production and enable applications across multiple device types.