MAKE POSSIBLE

Our blog is dedicated to a global discussion about the ideas, actions and technologies changing the world as we know it.

SPIE, panel, angstrom era

Collaboration is Key to Enabling Advanced Patterning in the Angstrom Era

by Regina Freed | March 5, 2024
 

At the recent SPIE Advanced Lithography + Patterning Conference, Applied Materials hosted a panel titled, Patterning in the Angstrom Era: It Takes an Ecosystem, which delved deep into the changes coming to the patterning infrastructure across design, process and control. I was fortunate to be on the panel along with experts from NVIDIA, Intel, imec and Siemens EDA.

Read More

Stay updated on our content.