The AKT-PiVot System 25KPX PVD is tailored for the Gen6 (1500x1850 mm²) LTPS/LTPO mobile market depositing critical film layers IGZO, ITO and Metal for TFTs and interconnects. The cluster concept enables fast tact time with high productivity, full redundancy amongst process modules while enabling low defect formation via unique particle control employing the long proven rotary target technology.

For IGZO PVD the architecture of the process chamber has been upgraded (PiVot 25KS) to enable mura-free LTPO device fabrication making possible the next generation mobile devices.