Applied’s new AKT 55KS PECVD system brings market-leading precision plasma-enhanced chemical vapor deposition (PECVD) technology to...
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As a fully automated vertical in-line sputtering system, the NEW ARISTO provides the highest throughput in the industry. Automated...
A state-of-the-art capacitive touch panel consists of multiple silicon dioxide (SiO2) indium tin oxide (ITO) metal and metal alloy films...
With minimal mechanical motion the AKT EBT TFT array tester realizes high-reliability, low scheduled down time and low running cost. The...
Current inline automated optical defect inspection tools for displays are not as effective as scanning electron microscopy (SEM)...
AKT-PECVD systems offer processes for both amorphous silicon (a-Si) and metal oxide (MOx) backplane technologies. Available films...
The Applied AKT-PX family of PECVD systems deposits highly-uniform low temperature polysilicon (LTPS) films on glass substrates from 1.6...
The AKT-PiVot 55K DT PVD and 25K DT PVD systems deposit critical film layers that create TFTs and interconnects on 2200mm x 2500mm and...
Plasma enhanced chemical vapor deposition – thin film encapsulation (PECVD-TFE) system the Enflexor™ Gen 6H PECVD deposits superior...
