Applied’s new AKT 55KS PECVD system brings market-leading precision plasma-enhanced chemical vapor deposition (PECVD) technology to...
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AKT's vertical dynamic sputtering system, the NEW ARISTO provides the highest throughput in the industry while providing superior film...
With minimal mechanical motion the AKT EBT TFT array tester realizes high-reliability, low scheduled down time and low running cost. The...
Current inline automated optical defect inspection tools for displays are not as effective as scanning electron microscopy (SEM)...
AKT-PECVD systems offer processes for both amorphous silicon (a-Si) and metal oxide (MOx) backplane technologies. Available films...
The AKT-PiVot System 25KPX PVD is tailored for the Gen6 (1500x1850 mm²) LTPS/LTPO mobile market depositing critical film layers IGZO,...
The Applied AKT-PX family of PECVD systems deposits highly-uniform low temperature polysilicon (LTPS) films on glass substrates from 1.6...
The AKT-PiVot System 25K DT PVD, 55K DT PVD and 100K PVD deposit critical film layers such as ITO, IGZO and Metal that create TFTs and...
Plasma enhanced chemical vapor deposition – thin film encapsulation (PECVD-TFE) system the Enflexor™ Gen 6H PECVD deposits superior...
