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Today’s global digital transformation is driving the need for lower-cost, higher-density DRAM chips, particularly for data center...
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In a standard photovoltaic module, a gap is maintained between the cells to provide clearance with the...
Building on more than 35 years of experience of electron beam and sputtering web coating, the TopBeam® 1100S system combines the...
Many different metals and oxides can be evaporated using Applied’s high-power electron beam evaporation. This process offers the highest...
The TopCoil™ platform complements Applied Materials’ evaporation portfolio with induction heated crucible technology. This is a solution...
With a coating speed of up to 20 meters per second, unparalleled productivity and winner of numerous design awards, the TopMet...
We offer two advanced AlOx processes and options for organic top-coating.
Our vacuum metallizer features inline printing of both grey-scale and patterned structures on polymeric substrates and paper,...
The Applied Vericell Solar Wafer Inspection System is the industry’s most advanced fully automated bare wafer inspection tool for...
Achieving world class photomask CD uniformity begins with the quality of resist coating. At the nanometer scale many subtle factors...
Cleaning methods for photomasks used in 193i and EUV lithography are driven by sensitive mask materials and the environments in which...
The use of chemically amplified resists for photomask manufacturing requires tight control of the post exposure bake (PEB) step, which...
Accurate development of the exposed resist pattern is essential to preserving the inherent CD uniformity of a photomask that has gone...
The best-in-class Applied Axcela PVD system has demonstrated process superiority and stability with non-uniformities of <2% 1σ over...
As semiconductor scaling has continued, increasingly rigorous requirements for precision and uniformity in chip fabrication have...
Semiconductor scaling continues steadily into the single-digit nodes, setting increasingly demanding requirements for precision and...
The Centura DPN HD (high dose) system consists of decoupled plasma nitridation (DPN) and post-nitridation anneal (PNA) chambers...
Applications in the advanced CMOS and MtM segments are driving the need for advanced 150mm and 200mm CVD technology. Ultra-thick oxides...
Responding to evolving power and MEMS device requirements, device manufacturers are targeting thicker epitaxial layers. Film thicknesses...
Applied Materials Centura Etch system delivers high-productivity silicon, metal, and dielectric etch. Etching is one of the most...
Tungsten, with its low resistivity and minimal electro-migration, has long been used in logic and memory devices as the material of...
Leveraging Applied’s epitaxy expertise gained with the industry-leading Centura RP Epi system over almost two decades, the Centura Prime...