Silicon Systems Group
Applied Materials Fellow
Applied Materials, Inc.
Dr. Mei Chang is the general manager of Atomic Layer Deposition in the Silicon Systems Group at Applied Materials, Inc. He is responsible for single wafer ALD products for inserting into applications such as copper barrier seed and high K metal gate.
Dr. Chang has held various technical and management positions in chemical vapor deposition, etch and physical vapor deposition since he joined Applied in 1983.
Dr. Chang received his Ph.D. in materials science and engineering from the University of California, Berkeley. He holds more than 100 patents in hardware and processes for tungsten, silicide, nitride deposition, surface treatment and etching.