Dr. Joe Olson is a principal member of technical staff for the Varian Semiconductor Equipment unit in the Silicon Systems Group at Applied Materials, Inc. He is responsible for large substrate and novel application implanters.
Prior to Applied’s acquisition of Varian Semiconductor Equipment Associates in November 2011, Dr. Olson was with Varian for 16 years, serving as a senior scientist and principal scientist before being named a Varian Fellow in 2004. Prior to joining Varian, he was a postdoctoral researcher at Los Alamos National Laboratory.
Dr. Olson earned a Ph.D. and a master’s degree in applied physics from Cornell University; a certificate of post graduate study from Cambridge University, where he was also a Churchill Scholar; and a bachelor’s degree with the highest distinction in honors physics from Purdue University. He is the author of more than 30 publications on ion beams and ion implantation and holds 50 U. S. patents.