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Anneal products are extensively used in semiconductor device manufacturing for changing electrical or physical properties of a material (conductivity, permittivity, densification, or contamination reduction).
Soak, spike, or millisecond anneals and thermal-radical oxidation are applied to different applications. The choice of technology depends on several factors, including the tolerance of the device to withstand a certain temperature/time exposure at a particular point in the manufacturing sequence. Applied’s portfolio of lamp- , laser- and heater-based systems encompasses the full range of anneal technologies, offering extendible solutions to such advanced-node challenges as pattern loading, thermal budget reduction, current leakage, interface quality optimization, and high-productivity treatments.