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The newest of our semiconductor processing platforms, the Centris clusters up to six independent process chambers and two plasma clean chambers, uniquely incorporated into the vacuum loadlocks, around a high-speed transfer robot that enables throughput of up to 180 wafers per hour – nearly twice that of competing alternatives.

The Centris platform incorporates “smart” system monitoring software and NIST-traceable reference standards to assure industry-leading uniformity and repeatability on every wafer processed – a critical requirement for high yield in tomorrow’s highly-complex chip designs.