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Based on more than 35 years of experience with electron beam web coating and sputtering web coating, the TopBeam™ 1100S system combines...
A wide variety of different metals and oxides can be evaporated with Applied’s high-power electron beam evaporation. This process offers...
The TopCoil™ platform complements Applied Materials’ evaporation portfolio with induction heated crucible technology. This is a solution...
With a coating speed of up to 20 meters per second, unparalleled productivity and winner of numerous design awards, the TopMet...
Two advanced AlOx processes and option for organic top-coating
Our vacuum metallizer features inline printing of both grey-scale and patterned structures on polymeric substrates and paper,...
Achieving world class photomask CD uniformity begins with the quality of resist coating. At the nanometer scale many subtle factors...
Cleaning methods for photomasks used in 193i and EUV lithography are driven by sensitive mask materials and the environments in which...
The use of chemically amplified resists for photomask manufacturing requires tight control of the post exposure bake (PEB) step, which...
Accurate development of the exposed resist pattern is essential to preserving the inherent CD uniformity of a photomask that has gone...
As semiconductor scaling has continued, increasingly rigorous requirements for precision and uniformity in chip fabrication have...
These films join the broad portfolio of processes available on the Centura DxZ CVD system. The foundation of Applied’s strength in...
In the DPN HD nitridation process, silicon oxide dielectric is infused with nitrogen using low-energy, pulsed plasma to create the...
The Applied Centura Epi system is a production-proven, single-wafer, multi-chamber epitaxial silicon deposition system with ~900 200mm...
New 200mm technology challenges that Applied Centura Etch Reactors address include: silicon etching of aspect ratios >100:1 for MEMS...
Tungsten, with its low resistivity and minimal electro-migration, has long been used in logic and memory devices as the material of...
CMOS technology requires two types of transistors: PMOS and NMOS. The former benefits best from applying compressive strain to the...
In the drive to maximize the functionality-to-volume ratio, device makers are integrating chips using schemes. TSV technology...
EUV photomasks differ fundamentally from conventional photomasks that selectively transmit 193nm wavelength light to project circuit...
The Applied Centura Tetra Z Photomask Etch system delivers state-of-the-art performance required to etch optical lithography photomasks...
Its reactor design and process technology enable deposition of both undoped and doped films for a wide range of applications, including...
Our Certified Refurbishment service is a perfect solution for customers looking for a simple way to repair broken parts and save the...
