Tza-Jing Gung is appointed vice president and general manager of CVD within the Dielectric Deposition Products business unit at Applied Materials, Inc. He is responsible for product technology and application development, and for growing market share across multiple segments of Dielectric CVD.
Dr. Gung previously led the Etch Strategic Products Group to achieve successful penetration for Mesa and Producer products. He first joined Applied Materials in 1999 to work on Metal Deposition (MDP), developing critical technologies for physical vapor deposition (PVD) that included high density DC plasma used to form conformal film, capillary-effect-assisted metal-filling technology, and self-collimated bottom up deposition with zero overhang and asymmetry. He also led groups in PVD and CVD.
Dr. Gung received his Ph.D. in electrical engineering and computer science from the Massachusetts Institute of Technology. He holds more than 30 patents for PVD and Etch products.