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2D Patterning

In situ” 2D patterning capability enables the direct formation of selectively doped regions without additional masking steps to create the pattern. 2D patterning is essential for a low-cost, simple process to manufacture PERL and IBC cells.

Our Solion XP Ion Implant System uniquely enables in-situ patterned doping by precise dosage control and dopant drive-in depth, and the simultaneous, accurate placement of phosphorous and boron. This precision enables critical control of the emitter sheet resistance for the manufacture of high efficiency solar cells with superior emitter junction quality, and improved uniformity over millions of wafers a year, resulting in an overall increase in fab efficiency and yield.