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The VIISta platform, launched by Varian Semiconductor Equipment in 1998, is the industry’s first common platform supporting an entire line of implant products. The platform was designed to accommodate four different products (high current, medium current, high energy, and plasma doping), maximizing commonality.

Making the ion generating source module, end station/process chamber, wafer handling, and software elements common to all of VSE’s implant products simplifies maintenance, training, and product support, reduces product support and manufacturing costs, leverages engineering creativity.