E3 Endura PVD Wafer Arc App

The E3 Endura Physical Vapor Deposition (PVD) Wafer Arc Detection app is a pre-emptive solution that increases wafer yield and reduces equipment downtime by diagnosing and fixing wafer arcing before it affects output. By monitoring data from key tool sensors associated with wafer arcing, the application can analyze readings and trigger an alarm if a limit is violated.

• Collects readings for tool instances during process runs
• Monitors and analyzes readings at etch key processing steps in the Ta(N) EnCore II chamber
• Displays charts according to monitoring and analysis parameters set by the user
• Sends email notification when alarm is triggered
• Results in lower maintenance—including 48 hours per year saved initially on Endura CuBS tools—and less unscheduled downtime, amounting initially to 228 hours annually
• Includes E3 strategy engine and E3 dashboard interface

Benefits

• Minimize unscheduled equipment downtime
• Reduce cycle time
• Reduce scrap
• Improve yields

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