VIISta 810XEr

The VIISta 810XEr sets the standard for precision, cleanliness, productivity, and production worthiness in the medium current ion implant market. The advanced design of the VIISta 810XEr ensures precision doping for high-volume manufacturing. Repeatable and accurate implant angle control is a critical parameter for advanced devices. The Varian Positioning System (VPS) delivers accurate and repeatable angle control over the full applications envelope.

The beamline architecture of the VIISta 810XEr delivers low metals, particle, cross-species, and contamination levels. A unique pre-filter magnet removes the majority of cross-species right at the source. The dual-magnet architecture isolates the wafer from beam-borne particles in the analyzer magnet and the mass resolving aperture regions.

Delivering 400WPH mechanical throughput, the VIISta 810XEr is offered as a cost-effective alternative to the advanced VIISta 810XP. In addition to Varian’s patented single-wafer parallel path wafer handling, fast beam set-up times and an option for higher beam current add to the impressive overall tool productivity.