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Centura HDP CVD 200mm

With over 1,000 systems in production world-wide, the Applied Centura Ultima HDP‑CVD (High-Density Plasma Chemical Vapor Deposition) is the industry-leading multi-generational workhorse delivering proven, void-free gap fill solutions for ≤200mm applications.

Applied Materials' patented Ultima HDP-CVD reactor design and process technology deposits both undoped (USG) and doped (PSG and FSG) films for a wide range of applications including shallow-trench isolation (STI), pre-metal dielectric (PMD), inter-level dielectric (ILD) inter-metal dielectric (IMD), and passivation.