Recognized as the industry benchmark for medium current performance and productivity, Varian Semiconductor’s single-wafer medium current VIISta series ion implanters provide superior overall throughput, precision, doping capability, and unmatched contamination control.
The VIISta Medium Current Family Features
- The industry’s highest throughput
- A patented dose control, ensuring precise implantations
- A unique dual-magnet beamline design, delivering up to 10X better contamination performance than batch systems
- The ability to support subMeV well applications
Common Platform
- Decreased time to first silicon
- Greater productivity across all applications
- Highest industry throughput
- Precise beam steering and tilt accuracy
- Flexible product mix changes
- Cost-effective training
- Increased return on investment