Technology/IP Licensing Featured Portfolios

Featured Portfolios:

Wafer Direct Write & Mask Writing

  • Investment in maskless e-beam lithography (Wafer Direct Write) is increasing as conventional lithography methods become more expensive and hit optical limits of printing small features
  • Portfolio of over 100 patent families is relevant to various next-generation Wafer Direct Write approaches: multi-beam, shaped beam, & multi-column
  • Also covers broad technology categories addressing Mask and/or Wafer Direct Write needs: e-beam & laser optics, pattern writing, pattern correction, data handling, and others 

Methods to Improve Defect Analysis Productivity

  • Portfolio includes methods for selectively marking wafers as well as defect analysis on mirror and notched wafers
  • 5 patent families consisting of 9 cases with international coverage
  • Valuable claims - broadly cited by industry leaders

Defect Source Identifier (DSI)

  • DSI is a system that automatically collects and analyzes wafer defect data and compares it with data in Defect Knowledge Library (DKL) to isolate the processing tool or tools responsible for defects on a wafer
  • Portfolio includes method and apparatus claims for providing communication between the DSI and a tool data collection control system
  • Portfolio of 6 US patents with international worldwide coverage

MEMS

  • Portfolio covers areas including: anti-stiction, release, end-point, particle removal, anodic bonding and methods to manufacture MEM structures and optical waveguides, bonding of alternating conductive and glass layers for micro columns in electron optics and in the formation of MEMS, deep recessed structure etching in MEMS
  • 22 patents: 16 granted (14 in US and 2 in Taiwan) and 6 pending cases with international coverage
  • Valuable claims – broadly cited by industry leaders

EBeam Cure

  • Technology and IP portfolio on apparatus and methods for curing ink on a substrate using an electron beam source
  • EBeam Cure is ideal for curing ink/organics where thermal budget becomes an issue from conventional thermal curing systems
  • Movable arm with EBeam emitter allows for curing of large substrates/areas

Applied Materials seeks prospective licensees for win-win collaborative deals.

For further information regarding a licensing and/or other collaboration proposal, click here.

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