Ion Implantation 101 - Part 1
Ion implantation is one of the fundamental processes used to make microchips. Raw silicon is neither a perfect insulator nor a perfect conductor. It’s somewhere in the middle. Inserting a smattering of boron or phosphorus atoms into the silicon crystal lattice allows us to control the flow of electricity through the silicon and make transistors – the building block from which we make chips.
In this two-part video features Jim Kawski from Applied’s Varian Semiconductor Equipment business unit, discussing why we need ion implantation, what the process looks like at the atomic level and how an actual implanter works. In the second part, Jim goes on to explore how implant is used to make actual semiconductor devices.
Ion Implantation 101 - Part 2
This is the second part of our introduction to ion implantation. Part one discussed why we need ion implantation and how an implanter works. In this second part, Jim Kawski from Applied’s Varian Semiconductor Equipment business group explores how implant is used to make actual semiconductor devices.