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Metal Gate Transistors
Vantage Vulcan RTP
The Applied Vantage Vulcan RTP system for spike and soak annealing offers the most advanced extendability among today's systems.
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| Sundar Ramamurthy, Ph.D introduces the Vantage Vulcan RTP system |
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Shankar Muthukrishnan "Introduction to RTP technology" |
In addition to superior temperature uniformity, the new system offers a much larger process range from ultra-low to ultra-high temperatures (150°C–1300°C) than is currently available. Thus, it combines the advanced spike capabilities of its predecessor, the Vantage RadiancePlus RTP system, with versatility for additional steps such as sub-second anneals, ultra-low-temperature anneals and a wide range of metal anneals. And its “fast spike” quench improves device performance by eliminating the long cool-down periods in spike anneals that can adversely affect the fabrication of fast-performance, low-power-consumption devices.
The Vulcan system is the first lamp-based RTP platform to offer closed-loop capability at almost room temperature through transmission-based, multi-point temperature measurement for low-temperature processing, which enables superior wafer-to-wafer repeatability. Interface engineering becomes critical at advanced nodes. The Vulcan system’s lower-temperature capability helps customers optimize interface quality when diffusing nickel or more advanced materials into silicon, which facilitates scaling to thinner, better silicides with improved yields.
Photo Gallery
Articles
- Superior Spike Annealing Performance in 65nm Source/Drain Extension Engineering, 13th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP 2005 (2.2MB, PDF)
- RTA-Driven Intra-Die Variations in Stage Delay, and Parametric Sensitivities for 65nm Technology, 2006 IEEE Symposium on VLSI Technology Digest of Technical Papers (350KB, PDF)
- Impact of intra-die thermal variation on accurate MOSFET gate-length measurement, ASMC 2009 (230KB, PDF)
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