Semiconductor

Vantage RadiancePlus RTP

Key Features

  • Continues Radiance chamber technology: honeycomb lamp source, seven-point temperature measurement, 100 Hz closed-loop control, 240 rpm wafer rotation
  • Optimized hardware and temperature control for unsurpassed spike anneal uniformity and extended low-temperature salicide processing
  • Convenient “plug and play” installation with integrated tool shipment and Vantage Docking Station

Applied Vantage RadiancePlus RTP is the industry-leading, high-productivity solution for high-volume, atmospheric RTP applications, combining world-class RTP chamber technology with a production-proven, low CoO platform. Its streamlined design allows for shipment as a single unit, enabling faster start-up and reduced time to production.

Applications: Implant, Ti/Co/Ni salicide, and other anneals; dry rapid thermal oxidation.

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