
What Does It Do
- Mechanical and centrifugal forces on wafers rotating in a closed chamber assist and enhance the reaction of chemicals on the wafer surface
- Multi-nozzle flow rate capability ensures uniform coverage to both sides of the wafer surface, a factor that is critical in smaller geometries
- Closed loop process control for statistical consistency
- Chemicals are continuously recycled and filtered
- Offers excellent temperature control through precision, rapid chemical heating
- Controller provides flexibility of chemical delivery methods to match process requirements
How Does It Work
- Wafers rotate within a cassette, increasing effectiveness and assuring even coverage across the entire surface
- On-axis orientation keeps wafers parallel in a closed chamber with multiple spray manifolds to simultaneously bathe both sides of the product
- Programming versatility allows control of process chemical routing to match specific requirements
What It Can Do For You
- High throughput for low cost of ownership
- Flexibility - featuring two, four, or seven tank configuration in small footprint cabinet; process chambers, product carriers, and quick-disconnect rotors are available for wafers up to 200mm
- Zero clean room floor space for flush mount systems - the smallest footprint-to-throughput ratio of any solvent processor available
- Designed around operator safety with protection redundancy and numerous software and hardware interlocks
- Low DI water usage
- Minimal exhaust requirements
- Chemical reclaiming capability to minimize chemical usage
- Reliable, low maintenance design
- Reduced metallic ion contamination via Semitool's patented SEP21 electropolished stainless steel manufacturing process
- Controlled environment provides consistent, repeatable performance
- Simple, intuitive Pentium-based, touch screen control system requires minimal training
This product is now supported by OEM Group (press release).
Please contact Tamara McKinney Berry for more information.