Spin Rinser Dryer

This high performance tool cleans, rinses and dries product as large as 300mm round or 300mm square. With 25 wafers per chamber, this tool is available in single or double-bowl configurations. Introduced in 1979, over 25,000 units have shipped worldwide. The SRD can be configured to benchtop, stand-alone or bulkhead fab requirements. 

Features

• Spray - On-axis orientation allows cold or hot (>50ºC) water to evenly spray the wafers
• Clean/Rinse - Built-in resistivity monitoring assures an automatic and reliable clean: the process chamber is cleaned with the product: quick-ramp, brushless DC motor provides economy and efficiency
• Dry - Centrifugal drying, coupled with heated, filtered nitrogen and a low-pressure nitrogen purge with blanket heaters

Efficient Chamber Design

• Flexible - Easy to change rotors for simple reconfiguration to match any array of applications
• Fast - A typical 25-wafer payload takes <7 minutes for a complete cycle (load, rinse, spin dry, unload
• Ultra Clean - On-axis orientation keeps wafers parallel, allowing fresh DI water manifolds to spray both sides of the product uniformly
• Efficient - Up to ten user-defined recipes
• Low CoO - Smallest footprint with the highest throughput available with over 95% uptime

This product is now supported by OEM Group (press release). 
Please contact Tamara McKinney Berry for more information.