Scepter Rinser Dryer

What Does It Do

• Quick ramp DC drive motor, centrifugal drying, and heated nitrogen dry combine to remove water and latent moisture economically and efficiently
• Increases the capacity to rinse and dry 50 wafers (two cassettes) in a single chamber.
• Increases throughput while minimizing fab floor space.
• Ultra-clean process
• Accommodates up to 200mm round media or wafers

How Does It Work

• High throughput; a typical 50-wafer cycle (load, DI rinse, spin dry, unload) takes less than seven minutes
• On-axis orientation keeps wafers parallel, allowing the DI water manifold to spray both sides of the product continuously and simultaneously
• Electropolished stainless steel process chamber, brushless DC drive motor, dampened actuation valves, and static reduction unit
• Built-in DI water rinse resistivity monitoring makes the cleaning process automatic and reliable
• Simple, intuitive control panel with built-in diagnostics, parameter verification, and memory for up to ten user-defined recipes
• Uses cold or hot (up to 50°C) DI water

What It Can Do For You

• Chamber/rotor design and increased fluid delivery system assure uniform coverage across all wafers
• The process chamber and rotor are rinsed along with the product, rinsing away all residual fluids and eliminating contamination to follow-on loads
• Centrifugal drying, coupled with heated, filtered nitrogen and a low-pressure nitrogen purge, produce a clean and dry final product
• The 50-wafer chamber is easily accessible by the operator. The Scepter Rinser Dryer meets the S8-99 ergonomic load height guidelines
• Highly configurable
• Cost-effective, space-efficient modular design

This product is supported by OEM Group (press release). 
Please contact Tamara McKinney Berry for more information.