Raider Mini ECD

The Raider M is an automated, high-performance single-wafer ECD system. It features a precision, fully automated wafer handling system coupled with individual process chambers and is compatible with automated chemical management systems. Processes and recipes developed on the Raider M plaform are directly transferable to the high volume manufacturing Raider GT ECD system, making the move from R&D to full production seamless and immediate.

• Advanced metal deposition chambers
• One or two process chambers
• 150, 200, or 300mm wafer sizes
• Built to SEMI S2/S8 guidelines
• Mini-environment with ionization
• Open cassette, SMIF, and FOUP load stations
• Small footprint (<2m²)
• Flexible design
• Advanced processing

Applications

• Electrolytic metal deposition (Cu, Au, Ni, Solder Alloys, etc.)
• Lead-free plating development
• 3-D Chip stacking R&D