Producer DARC PECVD

Applied Producer DARC (Dielectric Anti-Reflective Coating) PECVD (Plasma-Enhanced Chemical Vapor Deposition) is the industry-leading anti-reflective coating film for minimizing reflectivity, reducing photoresist poisoning, and improving photoresist adhesion for ≤90nm technologies.

When used in conjunction with Applied Materials' APF (Advanced Patterning Film) strippable CVD hardmask, the APF/DARC film stack provides litho-enabling solutions  for improved etch selectivity, CD control, and line edge roughness. The Applied Producer DARC PECVD offers a wide tuning range of refractive index and extinction coefficient values for unmatched reflectivity control across multiple applications, these films can be integrated in-situ with other CVD dielectrics for high efficiency and low cost of ownership.

DARC 193 offers a nitrogen-free film to minimize photoresist poisoning and improve photoresist adhesion. In addition to traditional gate, polysilicon and aluminum interconnect lithography applications, DARC 193 is an ideal candidate for dual damascene interconnect schemes with its excellent adhesion to low k dielectric films.

With its innovative Twin Chamber architecture, the Producer platform enables simultaneous processing of up to six wafers for superior productivity. Platform extendibility enables customers to leverage the Producer toolset for multiple process nodes.

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