Centura Carina Etch

The Applied Centura Carina Etch system continues Applied Materials' innovative heritage in Etch technology and is another industry first. Having excellent selectivity to silicon is crucial to the high-k dielectrics during the etching.  The Carina Etch clears the crux of transistor scaling beyond 45nm with unique high-temperature high-k etch processing. With capabilities that overcome the complex challenges of high-k etch, Carina propels technology beyond the bounds of today's conventional materials.

Carina's enhanced process window facilitates simultaneous satisfaction of requirements that, to date, have necessitated tradeoffs in performance among all commercially available high-k etch systems. And with a clear cost-of-ownership advantage gained through hardware and process productivity improvements.

Keep production high with Centura Carina Etch as a standalone system or integrated onto the Centura mainframe with AdvantEdge G3 Silicon Etch chambers and Axiom post-etch treatment chambers, as you navigate the transition to high-k/metal gates in logic and memory devices well beyond the limit of today's technology.

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