AKT-20K PX PECVD

Low-Temperature Polysilicon Deposition System for AMOLED and TFT-LCD Displays

The Applied AKT-20K PX PECVD system deposits highly-uniform low temperature polysilicon (LTPS) films on Generation 5.5 (1.95m², 1300x1500mm) glass substrates. LTPS films are essential to the fabrication of transistor arrays in active matrix OLED (AMOLED) and ultra-high resolution TFT-LCD displays.

The 1.95m² substrate size is three times larger in area than the previous standard, enabling manufacturers to produce more displays per substrate or to produce larger displays, helping to accelerate the transition to larger screen sizes for tablet PCs.

AMOLED and advanced TFT-LCD displays use polysilicon for the transistors instead of amorphous silicon which is used in conventional LCD displays. The higher electron mobility of polysilicon allows the transistors that control each pixel to be smaller and switch more quickly. This results in brighter, sharper displays that use less energy - highly desirable characteristics in mobile applications where image quality and battery life are critical.

(Diagram courtesy of HowStuffWorks.com.)