Equipment Performance

E3 Lithography Overlay Correction App

Key Features

  • Mix-and-match scheduling flexibility
  • Missing, delayed or out-of-order handling
  • Within-layer alignment for shot stitching
  • Alignment repeatability

The E3 Lithography Overlay Correction app is a run-to-run control solution that improves overall equipment effectiveness (OEE) by using patented control algorithms to eliminate disturbances affecting CD and lithography overlay. Manufacturers can maximize process yields and minimize product rework to improve process capability by as much as 30 percent over open-loop control systems.

  • Includes template strategies for overlay control that improve process capability and yields and for CD control that enhance final measurement control
  • Tracks product and historical data on tools, enabling engineers to recommend optimal recipe settings before processing and to adjust recipe parameters during manufacturing to keep products within spec
  • Supports rework and special-lot processing, flier and outlier data management, and automatic handling of reset and preventative maintenance
  • Integrates with other fab controllers, including etch CD control
  • Works with mix-and-match lithography tools

Benefits

  • Improve process capability
  • Improve yields
  • Optimizes lithography tool performance
  • Reduce product rework

To request product information from an automation software sales specialist, click here.