Equipment Performance

E3 Centura Ultima X HDP-CVD Chamber Pressure Monitor App

Key Features

  • Pre-defined interface to Centura Ultima HDP-CVD
  • Chamber pressure data collection points
  • Monitor and detection models
  • Alarm triggers for out-of-spec readings

The E3 Centura Ultima X HDP-CVD Chamber Pressure Monitor app improves throughput and equipment uptime by keeping chambers properly pressurized above a certain limit to eliminate wafer sticking on 300mm HDP systems.

  • Provides a tool interface between HDP systems and the E3 platform
  • Collects chamber-pressure readings continuously during process runs
  • Triggers an alarm and sends email notification when chamber pressure range exceeds the limit
  • Generates offline reports of chamber-pressure readings based on user-defined inputs

Benefits

  • Eliminate wafer sticking on HDP systems
  • Reduce unscheduled equipment downtime
  • Reduce scrap
  • Improve yields

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