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Vantage Milestone

Applied Materials celebrates the shipment of its 250th Applied Vantage RTP system, the tool-of-choice of 300mm device manufacturers worldwide. Enabling the broadest range of critical thermal processes, the Vantage platform is currently configurable with the Applied RadiancePlus RTP chamber for all anneal applications and the Applied RadOx chamber addressing oxidation steps in Memory and Logic. It is recognized by customers for its simplicity, form, and productivity.

Simplicity: The Vantage design combines best-in-class process performance and easy serviceability on a simple, compact footprint, maximizing efficiency and reducing complexity. Key design features include the patented honeycomb lamp-head for optimized uniformity and zoned in-situ tuning. For short manufacturing ramps, the Vantage improves startup time, shipping as one integrated unit with a very short install time.

Form. Designed for all critical thermal processes, is the most flexible RTP platform in the industry, serving spike, soak, contact and silicide anneals as well as radical oxidation, dry oxidation, thermal nitridation and advanced substrate applications.

Productivity. The most productive RTP system, Vantage consistently demonstrates >90% availability and features high throughput rates.

As advanced transistors and memory cells require more tightly controlled thermal processing, Vantage systems will continue to meet the most manufacturing challenges in advanced Logic, Flash, and DRAM. Simplicity. Form. Productivity. The Vantage RTP.

Applications:  Spike, soak, contact anneals
NiSi silicidation
Radical oxidation
Thermal nitridation
Dry oxidation

Learn more about Vantage RadiancePlus RTP
Learn more about Vantage RadOx RTP

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