Display Energy and Environment Fab Solutions Semiconductor Bright Future
Mask Products Technical Articles/Papers
Back
Mask Inspection
Aerial image-based off-focus inspection: lithography process window analysis during mask inspection, Society of Photo-Optical Instrumentation Engineers, Bacus/Photomask 2003 (651KB)
Mask Metrology
Corner roundness and contact area algorithms for reticle metrology through the use of region connectivity extraction, Society of Photo-Optical Instrumentation Engineers, Bacus/Photomask 2003 (768KB)
Mask Patterning
No articles at this time.
Tetra Mask Etch
Optimization of a 65nm Alternating Phase Shift Quartz Etch Process, Society of Photo-Optical Instrumentation Engineers, Bacus/Photomask 2003 (293KB)
Examination of Various Endpoint Methods for Chrome Mask Etch, Society of Photo-Optical Instrumentation Engineers, Bacus/Photomask 2003 (162KB)
View Archive
Back