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Mask Products Press Releases
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02/25/2005 Applied Materials Slashes Mask Development Time with Industry's First Automated OPC Qualification Tool
12/01/2004 Applied Materials and DuPont Photomasks to Collaborate Using the Applied ALTA 4700 for 90nm and 65nm Masks
12/01/2004 Applied Materials' New ALTA 4700 Laser Mask Writer Takes on 65nm Critical Layer Manufacturing
09/03/2003 Applied Materials Enters Mask Metrology Market with High-Performance SEM Technology; New RETicleSEM System Delivers Unmatched Measurement Precision and Imaging Performance
09/27/2001 Applied Materials Unveils New Photomask Etch System to Enable Nanometer Chip Generations

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