Applied Materials' UVision SP Solves Defect Inspection Challenges for Immersion Lithography at CNSE's Albany NanoTech

SANTA CLARA, Calif.--(BUSINESS WIRE)--Dec. 5, 2006--Applied
Materials, Inc. (Nasdaq:AMAT) today announced that its Applied
UVision(R) SP brightfield inspection system has achieved a significant
breakthrough in resolving defect inspection challenges related to
immersion(1) lithography at the College of Nanoscale Science and
Engineering (CNSE) of the University at Albany's Albany NanoTech
complex. Using new variable laser polarization technology, the UVision
SP is the first system to capture critical 30nm immersion lithography
defects, including micro-bridges between dense structures.

"The comprehensive detection results provided by the Applied
UVision SP system allowed full characterization and optimization of
the immersion lithography process," said Dr. James G. Ryan, professor
of nanoscience and associate vice president of technology at CNSE.
"The knowledge gained from defectivity trends and root cause studies
will be extremely beneficial in advancing the cutting-edge research
and development being conducted at CNSE's Albany NanoTech complex by
faculty, scientists and our growing complement of global corporate
partners."

The Applied UVision SP system's DUV laser inspection technology
provides a unique advantage in detecting immersion lithography-related
defects. While the DUV wavelength suppresses noise from previous
layers, the laser brightness and high-sensitivity photomultiplier
array capture the weak defect signals typically found in lithography
layers. Variable laser polarization capability further extends
UVision's sensitivity in finding small defects on complex backgrounds.
Visit http://www.appliedmaterials.com/products/resolution.html.

"We are excited to be part of the immersion lithography program at
the Albany NanoTech complex and are pleased with the outstanding
results obtained using the UVision SP system," said Dr. Gilad Almogy,
vice president and general manager of Applied Materials' Process
Diagnostics and Control Group. "With the UVision SP, chipmakers can
now fully characterize their immersion lithography process and move
closer to implementing it in production."

CNSE, the College of Nanoscale Science and Engineering of the
University at Albany-State Univ. of New York, is the first college in
the world devoted exclusively to the research, development and
deployment of innovative nanoscience, nanoengineering, nanobioscience
and nanoeconomics concepts. CNSE's Albany NanoTech complex has more
than 250 U.S. and worldwide partners, including some of the world's
largest semiconductor and semiconductor-related tool manufacturing
companies. For more information, visit CNSE website at
http://cnse.albany.edu.

Applied Materials, Inc. (Nasdaq:AMAT) is the global leader in
Nanomanufacturing Technology(TM) solutions with a broad portfolio of
innovative equipment, service and software products for the
fabrication of semiconductor chips, flat panels, solar photovoltaic
cells, flexible electronics and energy efficient glass. At Applied
Materials, we apply Nanomanufacturing Technology to improve the way
people live. Learn more at www.appliedmaterials.com.

(1) Immersion: a chip patterning technique for extending 193nm
wavelength lithography methods.

CONTACT: Applied Materials, Inc.

Betty Newboe, 408-563-0647 (editorial/media)

Randy Bane, 408-986-7977 (financial community)

SOURCE: Applied Materials, Inc.