News Archive

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2013 | 2012 | 2011 | 2010 | 2009
Media Advisory: Semiconductor Leaders to Debate Critical Interconnect Scaling Issues at Applied Materials Symposium
06.04.07
Applied Materials Releases Industry's Most Advanced Strain Engineering Technology to Boost 45nm Transistor Speed
05.15.07
Applied Materials Announces Results for Second Quarter of Fiscal 2007
05.15.07
Solaicx Closes $27.1 Million Series C Funding Round
05.08.07
Applied Materials to Hold Second Quarter FY 2007 Earnings Conference Call on May 15, 2007 at 4:30 p.m. ET
04.27.07
Applied Materials Delivers Critical 45nm Photomask Etch Technology with New Tetra III System
04.17.07
Sunfilm Opens New Solar Frontiers
04.04.07
Applied Materials Delivers Record Trench Depths with New Mariana Etch System
04.03.07

Events Archive

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Software Symposium | Shanghai (March 20) (中文)
03.20.13
Software Symposium | Shanghai (March 20)
03.20.13
ICE Europe 2013 | (March 19-21)
03.19.13
2013 Applied Materials Technical Symposium - UMC | Tainan (March 7)
03.07.13
2013 Applied Materials Technical Symposium: TSMC | Hsinchu (March 6)
03.06.13
2013 Taiwan Technical Symposium | Hsinchu (March 5)
03.05.13
Applied Materials Customer Reception at SPIE 2013 | San Jose (Feb. 26)
02.26.13
2013 Applied Materials Technical Symposium | Seoul (Jan. 31)
01.31.13
2012 Applied Materials Panel Discussion | San Francisco (Dec. 11)
12.11.12
2012 Applied Materials Technical Symposium | Tokyo (Dec. 7)
12.07.12
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Call: 1-408-563-5300

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