Headlines

• Applied Materials Redefines Mask Inspection with Powerful Aera2 System
• Applied Materials Sets the Standard for 32nm Mask Cleaning with New Tetra Reticle Clean System
• Applied Materials Delivers Critical 45nm Photomask Etch Technology with New Tetra III System

Photos

• Aera2 Mask Inspection
• Tetra III Advanced Reticle Etch
• Tetra Reticle Clean

Product/Technologies

• Aera2 Mask Inspection
• Tetra III Advanced Reticle Etch
• Tetra Reticle Clean

Resources

• Aerial Imaging Mask Inspection System for Immersion – See What You Print
• Corporate Profile and Factsheet
• Photo Gallery
• Technology Breakthroughs Pave the Way to 32nm Photomask Manufacturing 

For more information or executive interviews, send an e-mail to media_relations@amat.com.