Visit Us at EU PVSEC 2012!
Visit Applied Materials at the 27th EU PVSEC tradeshow to learn about our latest innovative wafer and cell manufacturing solutions. As the world's #1 provider of solar PV equipment, Applied Materials offers solar wafer and cell manufacturers state-of-the-art manufacturing equipment, process consulting and advanced automation and services to significantly increase cell efficiency, achieve high value cells, improve yield and reduce manufacturing cost.
Applied Materials will be participating in a number of presentations during the conference highlighting the latest technologies and results with our customers.
|
 |
EXHIBIT DATE & TIME
Sept. 25-27: 9:00 -18:00
Sept. 28: 9:00 - 16:00
CONFERENCE DATE & TIME
Sept. 24-27: 8:30 - 18:00
Sept. 28: 8:30 - 13:30
VENUE
MESSE Frankfurt
VISIT US AT
Hall 3, #G-10 |
| APPLIED MATERIALS TECHNOLOGY PRESENTATIONS* |
Oral Presentations
 |
| Monday, September 24 |
| 13:30 - 15:00 |
High Efficiency Back Contact Solar Cell via Ion Implantation
C.B. Mo, Samsung SDI |
| |
Silicon Material Impact on Back-Contact EWT Solar Cells
James Gee, Applied Materials |
| 17:00 - 18:30 |
Rear Passivated High Efficiency Solar Cells: Optimization of Aluminum Alloying in Local Contacts by Modifying Paste Formulation
Kapila Wijekoon, Applied Materials |
| Tuesday, September 25 |
| 15:15 - 16:45 |
Fully Implanted PERT and PERL Solar Cells
J. Benick, Fraunhofer ISE |
| Wednesday, September 26 |
| 13:30 - 15:00 |
Failure Analysis Techniques and Cell to Module Power Analysis for Back Contact Cell Modules
Sonya Xu, Applied Materials |
| Thursday, September 27 |
| 13:30 - 15:00 |
Efficiency Gain by Precise Printing over Selective Emitter: Results from Mass Production and Next Developments
Alessandro Voltan, Applied Materials |
| |
Enabling Technology for p-Type Surface Passivation of Si Solar Cells
Hemant Mungekar, Applied Materials |
| |
Synergistic Use of Ion Implant Annealing Processes for Thermal Oxide Rear Surface Passivation
S. Mack, Fraunhofer ISE |
| Friday, September 28 |
| 08:30 - 10:00 |
High-Efficient Ion Implanted Back Contact Cells for Industrial Application
A. Grohe, Bosch Solar Energy |
| *includes customer and co-authored presentations |
Poster Sessions
Silicon Feedstock, Crystallisation and Wafering
Monday, September 24
- Correlation of Wafer Surface Defects with Wire Sawing Parameters
- In-Line Metrology Sensitivity Analysis on Multiwire Sliced Wafers
- Numerical Simulation of the Multi-Wire Sawing Process Using Time-Varying Parameters and the Statistical Validations
- Thin Wafer Thickness Stability Study in Multi-Wire Saw
- Wire Saw Excursion Protection and Wire Breakage Prediction System to Improve Yield and Throughput
Silicon Solar Cell Improvements
Tuesday, September 25
- Development of Large-Area VHF-PECVD Technology for Production of High Efficiency Si Heterojunction Solar Cells
- Over 19% CE c-Si Cells Enabled by Ion Implantation (Customer)
- Over 19% CE of Selective Emitter c-Si Cells Enabled by Ion Implant (Customer)
Silicon Solar Cell Improvements
Wednesday, September 26
- Fine Line Printing through Screen and Stencil Printing
- Performance Comparison of High Efficiency Parasitic Rear Emitter Etched Solar Cells with Conventional Silicon Solar Cells
- Ion Implant Doping for n-Type Cz High Efficiency Industrial Boron Emitter Solar Cells with Single Activation Process
- Development of a MWT Baseline Process
- Selective Emitter Process Implementation on Applied Baccini Soft Line Printers Using Honeywell Screen Printable Dopant Paste
|
|
简体中文
繁體中文
English
日本語
한국어
