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Centura® Ultima HDP-CVD®

Applied Centura Ultima X HDP CVD(高密度プラズマ化学気相成長)チャンバは高スループットでメンテナンスが容易です。

Its reactor design and process technology enable deposition of both undoped and doped films for a wide range of applications, including STI, pre-metal dielectric, ILD, IMD, and passivation.