SPIE 2011
Celebrating 25 Years of Innovation

Join us for the Applied Materials panel session at this year’s SPIE Advanced Lithography conference in San Jose, California.

Come prepared to participate! This unique interactive session with audience response technology will make for fast-paced fun. Explore and celebrate 25 years of industry challenges, solutions, and innovation in metrology, inspection, and process control. Compete for great prizes as you test your knowledge against that of our technology experts.

Relax, refresh, and enjoy further discussions at the reception immediately following the session.

We look forward to seeing you there!

As with all regular sessions, you will need to register for the conference to gain admittance to this program.

Panel Session & Reception

March 1, 2011
4:30 - 5:30 PM
Reception to follow
San Jose Convention Center
San Jose, CA