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1979
| Sales: | $41.9M |
| R and D: | $5.4M |
| Patents: | 5 |
- Established Applied Materials Japan
1978
| Sales: | $27.8M |
| R and D: | $3.6M |
| Patents: | 3 |
1977
| Sales: | $23.7M |
| R and D: | $2M |
| Patents: | 6 |
- James C. Morgan named chief executive officer
1976
| Sales: | $16.9M |
| R and D: | $1.2M |
| Patents: | 7 |
- First commercial plasma chemical vapor deposition (CVD) system
1975
| Sales: | $13.1M |
| R and D: | $1.3M |
| Patents: | 8 |
- Established Great Western Silicon, a joint venture with Fairchild to produce the polycrystalline silicon used to make silicon wafers
1974
| Sales: | $28.9M |
| R and D: | $1.4M |
| Patents: | 10 |
- Moved into Building 1, a new facility on Bowers Avenue in Santa Clara, California, and consolidated all company activities under one roof
1973
| Sales: | $18.3M |
| R and D: | $992K |
| Patents: | 3 |
- Launched the In-Source 1500 physical vapor deposition system, a radio frequency inductive-heated source for evaporated aluminum
1972
| Sales: | $6.3M |
| R and D: | $687K |
| Patents: | 3 |
- Announced the company's first public stock offering
1971
| Sales: | $4.1M |
| R and D: | $707K |
| Patents: | 4 |
- Launched the AMC 740 Isomax, the first commercial epitaxial reactor Japan
- Opened first office in Europe
1970
| Sales: | $7.3M |
| Patents: | 5 |
- First commercial production system for depositing films used in LED displays
1969
- First radiantly-heated chemical vapor deposition reactor produced to build semiconductors
1968
- Entered the chemical vapor deposition market with the AMS 2600 Silox reactor, the first commercial system for depositing a thin film of silicon dioxide onto the surface of a wafer
- Introduced the AMV 800D vertical epitaxial reactor system, enabling processing of eight two-inch wafers at a time
1967
- Began in a small industrial unit in Mountain View, California
