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2011 Investor & Analyst Meeting
Breakout Sessions
Breakout Session 1: Advanced Transistors
Transistor Inflection: Complexity of High-k Metal Gate
Breakout Session 2: Wafer-Level Packaging
Wafer-Level Packaging Inflection
Semitool Testimonial Video
Breakout Session 3: New Display Technologies
Opportunities in Mobile Displays: LTPS, OLED and Touch
Video:
Silicon Systems Overview
Technical Briefings
Applied Raider GT Electrochemical Deposition
Uniform, small feature fill for copper interconnect fabrication at 22nm and beyond (829KB, PDF)
Applied Endura Avenir RF PVD NiPt
Enabling advanced silicides (1.4MB, PDF)
Applied Centura Conforma
Breakthrough conformal plasma doping technology for building 3D transistors (1.2MB, PDF)
Applied DFinder Darkfield Inspection
First deep UV darkfield tool with best sensitivity to particles-on-pattern (4.5MB, PDF)
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